Semiconductor Lithography Machine

 

Semiconductor lithography machine is a device used for lithography technology in the semiconductor chip manufacturing process. It uses optical projection technology to project the chip design pattern onto the silicon wafer, thereby forming fine lines and structures on the surface of the silicon wafer.

Semiconductor lithography machine usually consists of light source, lens system, mask, wafer stage and control system. Among them, the light source emits ultraviolet light, the lens system is used to project the pattern on the mask onto the silicon wafer, the silicon wafer stage is used to fix the silicon wafer and move it accurately, and the control system is used to control the entire photolithography process.

Semiconductor lithography machines have the characteristics of high resolution, high precision and high speed, and can form micron-level circuits and structures on silicon wafers. It plays a vital role in the semiconductor industry and is one of the key devices for realizing chip microstructure.

 

 

1. Terminology:

This machine consists of a host machine, a workbench, an electric control box and an accessory box.

The main machine consists of an exposure head, a microscope, a plate rack, a film-bearing table, a Z-direction motion device, a five-layer guide rail and a three-pin flat mechanism. The electric control box is installed behind the workbench. The accessory box contains "film-bearing tables" and "mask frames" of different specifications.

 

2. Exposure head:

(1) Exposure principle:

UV-LED ultraviolet lamp emits a large amount of ultraviolet light, which forms uniform illumination through a special optical system.

 

(2) Measurement and calculation of illumination uniformity:

Uniformity is measured with a UV detector (UV-A UV irradiation meter)

E max - E min

U = 1-────────×100%

Emax + Emin

 

(3)Control of exposure time

This machine is equipped with an imported time relay, which can pre-select the exposure time from 0.1 to 999.9 seconds.

3. Microscope: Use a continuously variable magnification monocular microscope. Compared with dual-field microscopes, this kind of monocular microscope has obvious advantages. It not only has clear magnification and high resolution, but also has a fast zoom conversion device. Therefore, it is greatly beneficial to improve the alignment speed.

 

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